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    Please use this identifier to cite or link to this item: http://nccur.lib.nccu.edu.tw/handle/140.119/111641

    Title: Green Patent 3.0: How to Promote Innovation for Environment beyond Green Channel
    Authors: Hsu, Mu-Yen
    Contributors: 科技管理與智慧財產研究所
    Keywords: Engineering;Technology;Australia;Examination process;Fundamental solutions;Institutional change;Patent applications;Patent system;South Korea;Patents and inventions
    Date: 2017-01
    Issue Date: 2017-08-03 14:29:38 (UTC+8)
    Abstract: In 2007 Conference of PICMET, I presented a paper 'Green Patent - Promoting Innovation for Environment by Patent System' to explore a kind of fundamental solution by refining the patent system. In order to alter the direction of the policy context of innovation, I introduced a new examination criterion, greenness, into the patent system, and discussed its feasibility and possible impacts. In 2009, UK announced the Green Channel to open a specific examination process for green patent and to fasten the examination speed of innovation for environment. Following the step of UK, Australia, South Korea, USA, Israel, Canada, Brazil, China and Taiwan open various kinds of Green Channel for green patent application. However, the scheme is required to answer 'What are green patents?' in advance. To solve this issue, the US EST Concordance was created to serve as a broad guide. EPO and WIPO announce the IPC Green Inventory. All of these institutional changes are in accord with my ideal of Green Patent. This research is aimed to discuss the differences between the executed Green Channel (Green Patent 2.0) and the PICMET 2007 version of Green Patent 1.0, and finally propose a more comprehensive scheme of Green Patent 3.0. © 2016 Portland International Conference on Management of Engineering and Technology, Inc.
    Relation: PICMET 2016 - Portland International Conference on Management of Engineering and Technology: Technology Management For Social Innovation, Proceedings, , 1787-1790
    2016 Portland International Conference on Management of Engineering and Technology, PICMET 2016; Honolulu; United States; 4 September 2016 到 8 September 2016; 類別編號CFP16766-ART; 代碼 125891
    Data Type: conference
    DOI 連結: http://dx.doi.org/10.1109/PICMET.2016.7806806
    DOI: 10.1109/PICMET.2016.7806806
    Appears in Collections:[科技管理與智慧財產研究所] 會議論文

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